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dc.contributor.authorde Alwis, KAD
dc.contributor.authorWijesinghe, PRD
dc.contributor.authorGanepola, GAD
dc.date.accessioned2024-03-26T05:50:38Z
dc.date.available2024-03-26T05:50:38Z
dc.date.issued2023-01
dc.identifier.urihttp://ir.kdu.ac.lk/handle/345/7533
dc.description.abstractNowadays, garment manufacturing companies face increased worldwide competitiveness and unpredictable demand variations. These demands push companies to continually enhance the effectiveness of their manufacturing processes to provide the final product in the shortest possible time and at the lowest possible cost. Traditional manual approaches, on the other hand, confront limitations in terms of subjectivity, time limits, and scalability, driving the study to propose ideal AI-based methods for garment quality inspection. This systematic study looks into the integration of artificial intelligence (AI) technologies such as Convolutional Neural Networks (CNNs), Artificial Neural Networks (ANNs), and many more AI technologies for quality control and defect detection in the clothing industry’s sewing segment. This focuses on innovations such as CNNs for identifying damaged stitches and the influence of ANN on the fashion supply chain. Future work recommendations include broadening AI-powered defect detection, incorporating AI into Industry 4.0, resolving ethical problems, and developing adaptive AI systems to handle dynamic changes in garment patterns. Overall, this analysis sheds light on the revolutionary potential of CNNs and ANNs in improving quality control in the clothing industry’s sewing division.en_US
dc.language.isoenen_US
dc.subjectApparel industry,en_US
dc.subjectArtificial intelligence,en_US
dc.subjectQuality control,en_US
dc.subjectDefect analysis,en_US
dc.subjectArtificial intelligenceen_US
dc.titleSystematic Review: Artificial Intelligence-Based Methods for Quality Control and Defect Analysis in the Apparel Industryen_US
dc.typeArticle Abstracten_US
dc.identifier.facultyFaculty of Computingen_US
dc.identifier.journalKDU SSFOCen_US


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